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Authors

Galatage, RV and Dong, H and Zhernokletov, DM and Brennan, B and Hinkle, CL and Wallace, RM and Vogel, EM

Year

2011

Month

January

Journal

Title

Effect of post deposition anneal on the characteristics of HfO2/InP metal-oxide-semiconductor capacitors

Status

Published

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Start Page

172901

End Page

Abstract

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